The Carolina D12B installation - completely automatic installation of a magnetron dusting - is intended for a magnetron dusting on ceramic, silicon and any flat (thickness no more than 30 mm) of a substrate up to Ø 100 mm in size (the maximum plane of the processed details of 100x350 mm).
Installation has a possibility of installation to 8 magnetrons with a target size 440×100×6×15 mm. (for example RS, chrome, copper, nickel, aluminum, vanadium, etc.), from within and outside of a cylindrical drum for a dusting:
- resistive films from PC 3710 materials; PC 5406; RS-1004, etc.
- films of the titan, nitride or oxide of the titan
- tantalum nitride
- aluminum up to 15 microns thick, copper to 15 microns,
- silicon dioxide and nitride of silicon up to 4 microns thick and with a speed up to 1.5 microns/hour on a drum.